Design and preparation of micro and nanostructures

μPG 101 Maskless Laser Lithography System (Heidelberg Instruments) with laser diode 405 nm and automatic alignment system; Ultra High Resolution Electron Beam Lithography Workstation (eLine Plus) equipped with Gas Injection System and nanomanipulators; Electron beam lithography module (XENOS XP G2) attached to JSM –6390 SEM (JEOL); Focused Ion Beam (Carl Zeiss NEON 40 EsB CrossBeam) with module for ion beam nanolithography (electron beam resolution 1.1÷2.5 nm for U = 20÷1 kV; ion beam resolution 7 nm at U = 30 kV).

μPG 101 Maskless Laser Lithography System (Heidelberg Instruments)

Ultra High Resolution Electron Beam Lithography Workstation (RAITH eLine Plus)

Carl Zeiss NEON 40 EsB CrossBeam