μPG 101 MASKLESS LASER LITHOGRAPHY SYSTEM (Heidelberg Instruments)
μPG 101 MASKLESS LASER LITHOGRAPHY SYSTEM is an equipment used for geometrical microstructuring (2D and 3D) activities based on laser lithography technique. The system can be used for applications such as Micro-Electro-Mechanical System (MEMS), BioMEMS, Integrated Optics, Micro Fluidics or any other application that requires high precision, high-resolution microstructures. The μPG 101 offers a very small footprint of only 60 x 75 cm² featuring a compact design with all electronic components integrated into the system.
The standard system is equipped with a diode laser which presents a reliable laser source with a long lifetime. This laser can be used to expose the standard photoresists that are used in lithography.
μPG 101 Maskless Laser Lithography system is located into an ISO 5 clean room space. The system is vibration protected.
μPG 101 Maskless Laser Lithography System
Technical specifications:
- Power: 230 VAC ±5%, 50 Hz ±0.5% (6 A)
or 110 VAC ±5%, 60 Hz ±0.5% (12 A) - Peak power: < 350 W
- Substrates: up to 6“ x 6“
- Standard substrate for masks: chromium coated plates of float glass or quartz with anti-reflection layer (e.g. chromium - oxide), or silicon wafers.
Services: High - resolution geometric microstructuring activities.