Equipment for Thin and Thick Films Preparation

Vacuum and controlled atmosphere deposition is a process used to deposit films of materials on a solid surface (substrate). The deposited films can range from a thickness of several atoms or molecules (ultrathin films: between 10 Å and several hundred Å) up to micrometres or even millimetres (thick films). The material deposition process can be generated in various ways:

  • thermal evaporation by Joule effect heating and e-beam heating
  • sputtering (RF and DC)
  • laser ablation, etc.

The following equipment are used to prepare thin films by the deposition processes in vacuum and controlled atmosphere at NIRDTP Iasi: