Micro-and nanostructures such as planar devices (Micro/Nano - Electromechanical Systems - MEMS and NEMS), planar micro and nanowires, magnetoresistive pillars, samples for Transmission Electron Microscopy (TEM), etc., are designed and geometrically structured by Laser Lithography, Electron Beam Lithography, ionic and in plasma etching techniques.

The following equipment is used for the preparation of the micro and nanostructures:

• Ultra High Resolution Electron Beam Lithography Workstation (eLine Plus)
• Focused Ion Beam (NEON 40 EsB / Carl Zeiss GmbH)
• μPG 101 Maskless Laser Lithography System (Heidelberg Instruments)
• Electron Beam Lithography module (XENOS XP G2) attached to JSM - 6390 SEM (JEOL)