Our research infrastructure is focused on two directions for nanomaterial development:



  • Facilities for Material Preparation, such as clean room facilities (ISO 5, ISO 7, ISO 8) (144 sq.m), equipment for the preparation of amorphous and nanocrystalline/nanostructured materials, equipment for thin films preparation in vacuum and controlled atmosphere, etc.
  • Facilities for Micro and Nanomaterial Characterisation, such as electromagnetic shielding room facilities, facilities for samples preparation prior to structural and morpholigical characterisation, thin films' thickness measuring system, etc.
  • ARCNanoSens